Atomic beam deposition of lanthanum-and yttrium-based oxide thin films for gate dielectrics

“Atomic beam deposition of lanthanum-and yttrium-based oxide thin films for gate dielectrics,” S. Guha, E. Cartier, M.A. Gribelyuk, N.A. Bojarczuk, M.C. Copel Applied Physics Letters , 77 (17), 2710, 2000

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